
UMC工艺列表,列表中没有的工艺请电话咨询!
CIS180 Image Sensor 1.8V/3.3V 2P4M
+0.18 µm CMOS Image Sensor 1.8 V/3.3 V 2P4M Metal Metal Capacitor Process Design Support
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Technology characteristics |
Shrink technology: NO |
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Wafer size |
8 inch |
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Deliverables |
# of dies: 50 for an MPW, 25 for a mini@sic run |
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Design tools |
Cadence CDBA, Laker |
|
Simulation tools |
HSPICE, Eldo, Spectre |
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Verification tools DRC |
Cadence, Mentor Graphics, Synopsys |
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Verification tools LVS |
Cadence, Mentor Graphics, Synopsys |
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Parasitic extraction tools |
Cadence, Mentor Graphics, Synopsys |
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P&R tools |
Cadence, Synopsys |
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Foundry IP |
Faraday standard cell libraries |
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MPW block size |
5mm x 5mm |
L180 EFLASH/EE2PROM
+UMC 0.18 µm 1.8V/3.3V 1P6M logic process with embedded Flash/EEPROM memories
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Technology characteristics |
Shrink technology: NO |
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Wafer size |
8 inch |
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Deliverables |
# of dies: 50 for an MPW, 25 for a mini@sic run |
|
Design tools |
Cadence CDBA, Laker |
|
Simulation tools |
HSPICE, Eldo, Spectre |
|
Verification tools DRC |
Cadence, Mentor Graphics, Synopsys |
|
Verification tools LVS |
Cadence, Mentor Graphics, Synopsys |
|
Parasitic extraction tools |
Cadence, Mentor Graphics, Synopsys |
|
P&R tools |
Cadence, Synopsys |
|
Foundry IP |
Faraday standard cell libraries |
|
MPW block size |
5mm x 5mm |
L180 Mixed Mode/RF 1.8V/3.3V 1P6M
+UMC L180 MM/RF 1.8V/3.3V 1P6M technology
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Technology characteristics |
Shrink technology: NO |
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Options that need special attention |
OTP |
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Wafer size |
8 inch |
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Deliverables |
# of dies: 50 for an MPW, 25 for a mini@sic run |
|
Design tools |
Cadence CDBA, Cadence OA, Laker, Mentor, Tanner, ADS |
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Simulation tools |
eldo, hspice, spectre |
|
Verification tools DRC |
Cadence, Mentor Graphics, Synopsys |
|
Verification tools LVS |
Cadence, Mentor Graphics, Synopsys |
|
Parasitic extraction tools |
Cadence, Mentor Graphics, Synopsys |
|
P&R tools |
Cadence, Synopsys |
|
Foundry IP |
Faraday standard cell libraries |
|
MPW block size |
5mm x 5mm |
L130 Logic/Mixed-Mode/RF
+0.13 µm Mixed-Mode and RFCMOS 1P8M Metal Metal Capacitor FSG Enhancement Process
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Technology characteristics |
Shrink technology: NO |
|
Wafer size |
12 inch |
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Deliverables |
90 dies / wafer on MPW, 45 dies / wafer on mini@sic |
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Design tools |
Cadence CDBA, Laker |
|
Simulation tools |
HSPICE, Eldo, Spectre |
|
Verification tools DRC |
Cadence, Mentor Graphics, Synopsys |
|
Verification tools LVS |
Cadence, Mentor Graphics, Synopsys |
|
Parasitic extraction tools |
Cadence, Mentor Graphics, Synopsys |
|
P&R tools |
Cadence, Synopsys |
|
Foundry IP |
Standard cells |
|
MPW block size |
5mm x 5mm |
L110AE Logic/Mixed-Mode/RF
+0.11 µm Logic and Mixed-Mode 1P8M Metal Metal Capacitor Al Advanced Enhancement Process.
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Technology characteristics |
Shrink technology: YES |
|
Wafer size |
8 inch |
|
Deliverables |
# of dies (no wafer!): 50 on an MPW, 25 on a mini@sic |
|
Design tools |
Cadence CDBA, Laker |
|
Simulation tools |
HSPICE, Eldo, Spectre |
|
Verification tools DRC |
Cadence, Mentor Graphics, Synopsys |
|
Verification tools LVS |
Cadence, Mentor Graphics, Synopsys |
|
Parasitic extraction tools |
Cadence, Mentor Graphics, Synopsys |
|
P&R tools |
Cadence, Synopsys |
|
Foundry IP |
Gate density |
|
MPW block size |
5mm x 5mm |
L65N Logic/Mixed-Mode/RF – Standard Performance
+65 nm Logic and Mixed-Mode Standard Performance Low-K Process
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Technology characteristics |
Shrink technology: NO |
|
Wafer size |
12 inch |
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Deliverables |
90 samples |
|
Design tools |
Cadence CDBA, Laker |
|
Simulation tools |
HSPICE, Eldo, Spectre |
|
Verification tools DRC |
Cadence, Mentor Graphics, Synopsys |
|
Verification tools LVS |
Cadence, Mentor Graphics, Synopsys |
|
Parasitic extraction tools |
Cadence, Synopsys, Mentor Graphics |
|
P&R tools |
Cadence, Synopsys |
|
Foundry IP |
Standard cells |
|
Dummy filling |
by Foundry |
|
MPW block size |
4000µm x 4000µm |
L65N Logic/Mixed-Mode/RF – Low Leakage
+65 nm Logic and Mixed-Mode Low Leakage Low-K Process
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Technology characteristics |
Shrink technology: NO |
|
Wafer size |
12 inch |
|
Deliverables |
90 samples |
|
Design tools |
Cadence CDBA, Laker |
|
Simulation tools |
HSPICE, Eldo, Spectre |
|
Verification tools DRC |
Cadence, Mentor Graphics, Synopsys |
|
Verification tools LVS |
Cadence, Mentor Graphics, Synopsys |
|
Parasitic extraction tools |
Cadence, Synopsys, Mentor Graphics |
|
P&R tools |
Cadence, Synopsys |
|
Foundry IP |
Standard cells |
|
MPW block size |
4mm x 4mm |
40N Logic/Mixed-Mode – Low Power
+40 nm Logic and Mixed-Mode Low Power Process
|
Technology characteristics |
Shrink technology: NO |
|
Wafer size |
12 inch |
|
Deliverables |
90 samples |
|
Design tools |
Cadence CDBA, Laker |
|
Simulation tools |
HSPICE, Eldo, Spectre |
|
Verification tools DRC |
Cadence, Mentor Graphics, Synopsys |
|
Verification tools LVS |
Cadence, Mentor Graphics, Synopsys |
|
Parasitic extraction tools |
Cadence, Synopsys, Mentor Graphics |
|
P&R tools |
Cadence, Synopsys |
|
Foundry IP |
Standard cells |
|
MPW block size |
4000µm x 4000µm |
28 nm Logic and Mixed-Mode High Performance Compact
+28 nm Logic and Mixed-Mode High Performance Compact Process
|
Technology characteristics |
Shrink technology: NO |
|
Wafer size |
12 inch |
|
Deliverables |
90 samples |
|
Design tools |
Cadence CDBA, Laker |
|
Simulation tools |
HSPICE, Eldo, Spectre |
|
Verification tools DRC |
Cadence, Mentor Graphics, Synopsys |
|
Verification tools LVS |
Cadence, Mentor Graphics, Synopsys |
|
Parasitic extraction tools |
Cadence, Synopsys, Mentor Graphics |
|
P&R tools |
Cadence, Synopsys |
|
Foundry IP |
Standard cells |
|
Dummy filling |
by Foundry |
|
MPW block size |
4000µm x 4000µm |